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Author

Dan Rost

Observed institution: MP Technologies (United States)
OpenAlex ID: A5087918918
Automatic classification of blank substrate defects
2014 · Tom Boettiger, Peter Buck, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield
2009 · Shmoolik Mangan, Erik Byers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Aera193i: aerial imaging mask inspection for immersion lithography
2007 · Yoel Zabar, Chaim Braude, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Qualification of aerial image 193nm inspection tool for all masks and all process steps
2008 · Dan Rost, Raunak Mann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Controlling phase induced CD non-uniformity effects of PSM photo-masks
2008 · Dan Rost, Michael Ben-Yishai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Analyzing Mars on Earth Using Multiple Hyperspectral Imaging Methods
2006 · Edward P. Vicenzi, Dan Rost · AGU Spring Meeting Abstracts
Works count: 6
Citation count: 18
H-index: 2
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