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Rachel Ren

Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield
2009 · Shmoolik Mangan, Erik Byers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Automatic setup of in-line critical dimension (CD) recipes during OPC qualification in a foundry environment
2007 · Yasri Yudhistira, Quek Shyue Fong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 2
Citation count: 6
H-index: 1
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