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Merri Carlson
Institution:
Micron (United States)
Observed institution:
Micron (United States)
OpenAlex ID:
A5086982320
Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield
2009
·
Shmoolik Mangan
, Erik Byers
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
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