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Author

Lior Shoval

OpenAlex ID: A5032936672
Applicability of e-beam mask inspection to EUV mask production
2012 · Lior Shoval, Shmoolik Mangan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield
2009 · Shmoolik Mangan, Erik Byers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
IntenCD: mask critical dimension variation mapping
2008 · Amir Sagiv, Netanel Polonsky, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
An IntenCD map of a reticle as a feed-forward input to DoseMapper
2008 · Michael Ben Yishai, Jo Finders, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Extending DUV mask inspection tool for inspecting 2xnm HP and beyond
2013 · Jihoon Na, Sang Hoon Han, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
EUV mask defectivity study by existing DUV tools and new e-beam technology
2010 · Shmoolik Mangan, Rik Jonckheere, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Evaluation of novel EUV mask inspection technologies
2010 · Shmoolik Mangan, Aya Kantor, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Aerial imaging for FABs: productivity and yield aspects
2009 · Ilan Englard, Yaron Cohen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Study of EUV mask e-beam inspection conditions for HVM
2011 · Shmoolik Mangan, C. C. Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
IntenCD: an application for CD uniformity mapping of photomask and process control at maskshops
2008 · Heebom Kim, MyoungSoo Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Controlling phase induced CD non-uniformity effects of PSM photo-masks
2008 · Dan Rost, Michael Ben-Yishai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Study of EUV mask e-beam inspection conditions for HVM
2011 · Shmoolik Mangan, C. C. Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 12
Citation count: 38
H-index: 4
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