Author

Paul F. Luehrmann

Observed names: Paul F. Luehrmann, Jr., Paul Luehrmann

Observed institution: ASML (Netherlands)

OpenAlex ID: A5043639633

0.35-μm lithography using off-axis illumination

1993 · Paul F. Luehrmann, Jr., Peter van Oorschot, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield

2009 · Shmoolik Mangan, Erik Byers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Improving the performance and usability of a wet-developable DUV resist for sub-500nm lithography

1991 · Nandasiri Samarakone, Veerle Van Driessche, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

An IntenCD map of a reticle as a feed-forward input to DoseMapper

2008 · Michael Ben Yishai, Jo Finders, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-μm gate printing

1998 · Kurt G. Ronse, Mireille Maenhoudt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Focal plane determination for sub-half micron optical steppers

1993 · Sunny Stalnaker, Paul Luehrmann, et al. · Microelectronic Engineering · 4

Improvements in 0.5-micron production wafer steppers

1991 · Paul F. Luehrmann, Jr., Chris G. M. de Mol, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Improvement of the focus exposure latitude using optimized illumination and mask design

1994 · Rainer Pforr, Kurt G. Ronse, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules

1992 · Barton A. Katz, James S. Greeneich, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Improving lithographic performance for 32 nm

2010 · Jens Busch, Anne Parge, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Simulation-based scanner tuning using FlexRay capability and scatterometry

2011 · Karsten Bubke, Matthias Ruhm, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Use of scatterometry for scanner matching

2011 · Holger Bald, Rolf Seltmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Practical 0.35-um i-line lithography

1994 · Paul F. Luehrmann, Jr., Stefan Wittekoek, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Pulsed-laser, high-speed, front-lit photography of propellant deflagration (A)

1984 · Paul F. Luehrmann, Roger J. Becker · Journal of the Optical Society of America A

Works count: 14

Citation count: 44

H-index: 4

I10-index: 1