OpenAlex | Etch-mask of pyrolytic-photoresist thin-film for self-aligned fabrication of smooth and deep faceted three-dimensional microstructures

Etch-mask of pyrolytic-photoresist thin-film for self-aligned fabrication of smooth and deep faceted three-dimensional microstructures

Work

Year: 1996

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Authors G. A. Porkolab, Shih‐Hsiang Hsu, J.V. Hryniewicz, Wenhua Lin, Y. J. Chen +5 more

Institutions University of Maryland, Baltimore County, University of Maryland, College Park, Physical Sciences (United States)

Cites:

Cited by: 9

Related to: 10

FWCI: 0.622

Citation percentile (by year/subfield): 59.47

Topic: Silicon Nanostructures and Photoluminescence

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed