Using Self-Assembled Monolayers Exposed to X-rays To Control the Wetting Behavior of Thin Films of Diblock Copolymers
Year: 2000
Type: article
Source: Langmuir
DOI: 10.1021/la991500c
Authors: Richard D. Peters, Xiao M. Yang, Tae K. Kim, B. H. Sohn, Paul F. Nealey
Institution: University of Wisconsin–Madison
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2020969041