Work

Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2045328

Authors: J. Andres Torres, Kyohei Sakajiri, David Fryer, Yuri Granik, Yuansheng Ma, Polina Krasnova, Germain Fenger, Seiji Nagahara, Shinichiro Kawakami, Benjamen Rathsack, Gurdaman Khaira, Juan de Pablo, Julien Ryckaert

Institutions: Mentor Graphics (United States), Tokyo Electron (Japan), Tokyo Electron Kyushu Ltd (Japan), University of Chicago, IMEC

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2033590394

FWCI: 19.45

Cites: 7

Cited by: 18

Related to: 10