Work

One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers

Year: 2009

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.200900518

Authors: Tomoyasu Hirai, Melvina Leolukman, Chi Chun Liu, Eungnak Han, Yun Jun Kim, Yoshihito Ishida, Teruaki Hayakawa, Masa‐aki Kakimoto, Paul F. Nealey, Padma Gopalan

Institutions: Tokyo Institute of Technology, University of Wisconsin–Madison

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Semiconductor Research Corporation, University of Wisconsin-Madison, University of Tokyo

OpenAlex ID: W2034205871

FWCI: 5.377

Cites: 31

Cited by: 185

Related to: 8