2010 · Chi-Chun Liu, Paul F. Nealey, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 66

Cross-Linked Random Copolymer Mats As Ultrathin Nonpreferential Layers for Block Copolymer Self-Assembly

2009 · Eungnak Han, Padma Gopalan · Langmuir · 62

Electronic Transport and Raman Scattering in Size-Controlled Nanoperforated Graphene

2012 · Myungwoong Kim, Nathaniel S. Safron, et al. · ACS Nano · 54

Bulk and Thin Film Morphological Behavior of Broad Dispersity Poly(styrene-b-methyl methacrylate) Diblock Copolymers

2013 · Joan M. Widin, Myungwoong Kim, et al. · Macromolecules · 47

Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography

2010 · Eungnak Han, Melvina Leolukman, et al. · ACS Nano · 35

A Dual Functional Layer for Block Copolymer Self-Assembly and the Growth of Nanopatterned Polymer Brushes

2013 · Daniel P. Sweat, Myungwoong Kim, et al. · Langmuir · 27

Degree of Perfection and Pattern Uniformity in the Directed Assembly of Cylinder-Forming Block Copolymer on Chemically Patterned Surfaces

2011 · Huiman Kang, Gordon S. W. Craig, et al. · Macromolecules · 26

Interplay of surface chemical composition and film thickness on graphoepitaxial assembly of asymmetric block copolymers

2013 · Myungwoong Kim, Eungnak Han, et al. · Soft Matter · 24

Chemical Patterns from Surface Grafted Resists for Directed Assembly of Block Copolymers

2012 · Eungnak Han, Myungwoong Kim, et al. · ACS Nano · 20

Extending resolution limits of EUV resist materials

2015 · Marie Krysak, Michael Leeson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight

2007 · K. O. Stuen, I. In, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 17

Cyclopolymerization of α-methylbenzyl dipropargylamine by transition metal catalysts

2007 · Yeong-Soon Gal, Won-Chul Lee, et al. · Macromolecular Research · 17

DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification

2024 · Eungnak Han, Gurpreet Singh, et al. · SPIE Novel Patterning Technologies · 8

A facile route for fabricating graphene nanoribbon array transistors using graphoepitaxy of a symmetric block copolymer

2015 · Jonathan W. Choi, Myungwoong Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Depth profiling chemical changes in chemically amplified resists for EUV lithography

2026 · Daniel F. Sunday, Peter Dudenas, et al. · Journal of Micro/Nanopatterning Materials and Metrology

Integrated patterning of self-aligned trench contacts using directed self-assembly (DSA)

2026 · Manish Chandhok, Gurpreet Singh, et al. · SPIE Novel Patterning Technologies

Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch

2015 · Eungnak Han, Todd R. Younkin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 28

Citation count: 2,077

H-index: 18

I10-index: 20