Work

Bulk and Thin Film Morphological Behavior of Broad Dispersity Poly(styrene-b-methyl methacrylate) Diblock Copolymers

Year: 2013

Type: article

Source: Macromolecules

DOI: 10.1021/ma4004538

Authors: Joan M. Widin, Myungwoong Kim, Adam K. Schmitt, Eungnak Han, Padma Gopalan, Mahesh K. Mahanthappa

Institution: University of Wisconsin–Madison

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Wisconsin Alumni Research Foundation, DuPont, University of Wisconsin-Madison, Basic Energy Sciences

OpenAlex ID: W2047675845

FWCI: 2.805

Cites: 62

Cited by: 47

Related to: 10