Work

Infrared spectroscopy study of initial stages of oxidation of hydrogen-terminated Si surfaces stored in air

Year: 1994

Type: article

Abstract: We have studied the initial stages of oxidation of the hydrogen-terminated Si(111) and (100) surfaces stored in air, using infrared spectroscopy in the multiple internal reflection geometry. We investigate the effect of surface roughness and humidity of air on the oxidation of the hydrogen-terminated Si surfaces. We suggest that surface roughness on a microscopic scale does not significantly affect the oxidation of the hydrogen-terminated Si surface and the oxidation occurs on the entire surface. It is demonstrated that water is predominantly involved in the oxidation of the surface Si—H bond, and that the surface Si—H bond is quite inert to the oxygen molecule.

Source: Journal of Applied Physics

DOI: 10.1063/1.357627

Authors: Michio Niwano, Jun-ichi Kageyama, Kazunari Kurita, Koji Kinashi, Isao Takahashi, Nobuo Miyamoto

Institutions: Tohoku University, Research Institute of Electrical Communication, Tohoku University

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W2037026858

FWCI: 12.46

Cites: 17

Cited by: 242

Related to: 10