Note: Measuring effects of Ar-ion cleaning on the secondary electron yield of copper due to electron impact
Year: 2012
Type: article
Source: Review of Scientific Instruments
DOI: 10.1063/1.4729379
Institution: Xi'an Jiaotong University
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Award: 复杂空间电子辐照条件下电介质带电动态特性研究
OpenAlex ID: W2044031993