Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)
Year: 2005
Type: conference-paper
DOI: 10.1117/12.599435
Authors: H. Oizumi, Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, K. Murakami
Institutions: Association of Super-Advanced Electronics, Nikon (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2049338386