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Iwao Nishiyama

Observed names: I Nishiyama, I. NISHIYAMA, I. Nishiyama, Iwao NISHIYAMA, Iwao Nishiyama Iwao Nishiyama, Nishiyama, I.
Observed institutions: NEC (Japan), Kyushu Institute of Technology, NTT (Japan), Association of Super-Advanced Electronics, Institute for Molecular Science, Semiconductor Leading Edge Technologies, Inc (Japan), The University of Tokyo
OpenAlex ID: A5113614445
Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist
2006 · Takahiro Kozawa, Seiichi Tagawa, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 114
Ultrathin Tantalum Oxide Capacitor Dielectric Layers Fabricated Using Rapid Thermal Nitridation prior to Low Pressure Chemical Vapor Deposition
1993 · Satoshi Kamiyama, Pierre‐Yves Lesaicherre, et al. · Journal of The Electrochemical Society · 86
Development of the point diffraction interferometer for extreme ultraviolet lithography: Design, fabrication, and evaluation
2002 · K. Otaki, K. Ota, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 78
Reduction of oxide layer on Ru surface by atomic-hydrogen treatment
2005 · I. Nishiyama, H. Oizumi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 63
Depth profile analysis of the photochemical degradation of polycarbonate by infrared spectroscopy
2003 · N Nagai, H Okumura, et al. · Polymer Degradation and Stability · 46
Selete's EUV program: progress and challenges
2008 · Ichiro Mori, Osamu Suga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 45
Progress in EUV Resist Development
2007 · Daisuke Shimizu, Ken Maruyama, et al. · Journal of Photopolymer Science and Technology · 40
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Impact of EUV light scatter on CD control as a result of mask density changes
2002 · Christof G. Krautschik, Masaaki Ito, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 37
Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror
2002 · K. Otaki, T. Yamamoto, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 37
Cleaning technology for EUV multilayer mirror using atomic hydrogen generated with hot wire
2007 · Kumi Motai, Hiroaki Oizumi, et al. · Thin Solid Films · 36
Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)
2005 · H. Oizumi, Y. Tanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 36
Effect of incident angle of off-axis illumination on pattern printability in extreme ultraviolet lithography
2003 · Minoru Sugawara, Akira Chiba, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 33
Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer
2005 · H. Oizumi, H. Yamanashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 32
Oxidation and reduction of thin Ru films by gas plasma
2007 · Y. Iwasaki, A. Izumi, et al. · Applied Surface Science · 30
Infrared photodissociation of the benzene dimer. Translational energy distribution of dissociation fragments
1985 · I. Nishiyama, I. Hanazaki · Chemical Physics Letters · 30
Reduction of oxide layer on various metal surfaces by atomic hydrogen treatment
2007 · Akira Izumi, Tomoya Ueno, et al. · Thin Solid Films · 29
Depth profile analysis of ion‐implanted photoresist by infrared spectroscopy
2002 · N. Nagai, T. Imai, et al. · Surface and Interface Analysis · 29
Atomic Hydrogen Cleaning of Surface Ru Oxide Formed by Extreme Ultraviolet Irradiation of Ru-Capped Multilayer Mirrors in H 2 O Ambience
2007 · Hiroaki Oizumi, Akira Izumi, et al. · Japanese Journal of Applied Physics · 27
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Performance of molecular resist based on polyphenol in EUV lithography
2006 · Hiroaki Oizumi, Fumiaki Kumasaka, et al. · Microelectronic Engineering · 27
Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations
2001 · Christof G. Krautschik, Masaaki Ito, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27
An analysis of EUV-resist outgassing measurements
2007 · Kim R. Dean, Iwao Nishiyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26
Depth profile analysis of chemically amplified resist by using TOF-SIMS with gradient shaving preparations
2004 · N. Man, H. Okumura, et al. · Applied Surface Science · 26
Anisotropic Si(100) etching induced by high translational energy Cl2 molecular beams
1993 · Yuden Teraoka, Iwao Nishiyama · Applied Physics Letters · 26
Evaluation of New Molecular Resist for EUV Lithography
2007 · Hiroaki Oizumi, Yuusuke Tanaka, et al. · Journal of Photopolymer Science and Technology · 25
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Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning
2008 · Yasushi Nishiyama, Toshihisa Anazawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24
Works count: 154
Citation count: 1,703
H-index: 24
I10-index: 52
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