Work

Effect of incident angle of off-axis illumination on pattern printability in extreme ultraviolet lithography

Year: 2003

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1624264

Authors: Minoru Sugawara, Akira Chiba, Iwao Nishiyama

Institution: Association of Super-Advanced Electronics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Economy, Trade and Industry

OpenAlex ID: W2005394878

FWCI: 2.317

Cites: 10

Cited by: 33

Related to: 10