Work

Impact of EUV light scatter on CD control as a result of mask density changes

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.472302

Authors: Christof G. Krautschik, Masaaki Ito, Iwao Nishiyama, Shinji Okazaki

Institution: Association of Super-Advanced Electronics

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1967589360

FWCI: 3.755

Cites:

Cited by: 37

Related to: 10