Work

Silicon on quartz reflective masks for 0.25-μm microlithography

Year: 1991

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.585327

Authors: Y. H. Lee, R. L. Hsieh, A. Grenville, R. von Bünau, C. C. Tsai, D. A. Markle, G. Owen, R. Browning, R. F. W. Pease

Institution: Stanford University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2055594758

FWCI:

Cites:

Cited by: 1

Related to: 10