Work

Statistical simulation of photoresists at EUV and ArF

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.813551

Authors: John J. Biafore, Mark D. Smith, Chris A. Mack, James W. Thackeray, Roel Gronheid, Stewart A. Robertson, Trey Graves, David Blankenship

Institutions: KLA (United States), ROHM, IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2063069390

FWCI: 4.216

Cites: 6

Cited by: 59

Related to: 10