Get started
Author

Trey Graves

Institution: KLA (United States)
Observed institutions: KLA (Israel), KLA (United States)
OpenAlex ID: A5036596808
Statistical simulation of photoresists at EUV and ArF
2009 · John J. Biafore, Mark D. Smith, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 59
Mechanistic simulation of line-edge roughness
2007 · John J. Biafore, Mark D. Smith, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 28
Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists
2017 · Alessandro Vaglio Pret, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27
Comprehensive EUV lithography model
2011 · Mark D. Smith, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Simulation of optical lithography in the presence of topography and spin-coated films
2009 · Stewart A. Robertson, Michael T. Reilly, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Rigorous physical modeling of a materials-based frequency doubling lithography process
2008 · Stewart A. Robertson, John J. Biafore, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Comparative stochastic process variation bands for N7, N5, and N3 at EUV
2018 · Peter De Bisschop, Alessandro Vaglio Pret, et al. · Extreme Ultraviolet (EUV) Lithography · 6
Methods for benchmarking photolithography simulators: part III
2005 · Mark D. Smith, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
DSA graphoepitaxy calibrations for contact hole multiplication
2015 · Trey Graves, Alessandro Vaglio Pret, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Impact of mask line roughness in EUV lithography
2011 · Alessandro Vaglio Pret, Roel Gronheid, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
The modeling of double patterning lithographic processes
2007 · Stewart A. Robertson, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Non‐Gaussian CD distribution characterization for DRAM application in EUV lithography
2018 · Alessandro Vaglio Pret, Inhwan Lee, et al. · International Conference on Extreme Ultraviolet Lithography · 4
Gaining insight into effective metrology height through the use of a compact CDSEM model for lithography simulation
2016 · Chao Fang, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Mask absorber roughness impact in extreme ultraviolet lithography
2011 · Alessandro Vaglio Pret, Roel Gronheid, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 4
The impact of attenuated phase shift mask topography on hyper-NA lithography
2005 · Chris A. Mack, Mark D. Smith, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection
2023 · Eunju Kim, Wooseok Kim, et al. · International Conference on Extreme Ultraviolet Lithography · 3
OPC strategies to reduce failure rates with rigorous resist model stochastic simulations in EUVL
2019 · Alessandro Vaglio Pret, Trey Graves, et al. · Extreme Ultraviolet (EUV) Lithography · 2
Investigating the impact of topography on pitch splitting double patterning using rigorous physical simulation
2009 · Stewart A. Robertson, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
RET selection using rigorous, physics-based computational lithography
2008 · Sanjay Kapasi, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Optimization of EUV patterning using computational lithography for large-area stochastic hot spot prediction
2025 · Jaeyoung Choi, Jungkee Choi, et al. · SPIE Optical and EUV Nanolithography · 1
On the origin and evolution of hotspots in multipatterning processes
2023 · Prem Panneerchelvam, Chad M. Huard, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 1
Reflectivity metrics for optimization of anti-reflection coatings on wafers with topography
2010 · Mark D. Smith, Trey Graves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Lithographic characterization of evanescent wave imaging systems
2007 · Trey Graves, Mark D. Smith, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Methods for benchmarking photolithography simulators: part IV
2006 · Trey Graves, Mark D. Smith, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Methods for benchmarking photolithography simulators: part III
2005 · Mark D. Smith, Trey Graves, et al. · Optical Microlithography XVIII · 1
Works count: 33
Citation count: 204
H-index: 6
I10-index: 4
Year
Topic
Type