Work

Mechanistic simulation of line-edge roughness

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.712868

Authors: John J. Biafore, Mark D. Smith, Stewart A. Robertson, Trey Graves

Institution: KLA (United States)

Language: German

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2069445648

FWCI: 3.515

Cites: 15

Cited by: 28

Related to: 10