Work

Rigorous physical modeling of a materials-based frequency doubling lithography process

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.772736

Authors: Stewart A. Robertson, John J. Biafore, Trey Graves, Mark D. Smith

Institution: KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2053620486

FWCI: 3.791

Cites: 7

Cited by: 8

Related to: 10