An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas
Year: 1996
Type: article
Source: Journal of Materials Science
DOI: 10.1007/bf00372203
Institutions: University of Sheffield, RWTH Aachen University
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2070215100