Work

Dense Self‐Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

Year: 2008

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.200800826

Authors: Joy Y. Cheng, Charles T. Rettner, Daniel P. Sanders, Ho‐Cheol Kim, William D. Hinsberg

Institution: IBM Research - Almaden

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2074791001

FWCI: 13.4

Cites: 25

Cited by: 319

Related to: 10