Application of attenuated phase-shift masks to sub-0.18-μm logic patterns
Year: 2000
Type: conference-paper
DOI: 10.1117/12.388955
Authors: Michael Fritze, Peter W. Wyatt, David K. Astolfi, Paul Davis, Andrew V. Curtis, Douglas M. Preble, Susan G. Cann, Sandy Denault, David Y. Chan, Joe C. Shaw, Neal T. Sullivan, Robert Brandom, Martin E. Mastovich
Institutions: MIT Lincoln Laboratory, Photronics (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2082485407