Work

A new formula for secondary emission yield

Year: 1989

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/16.34278

Author: J.R.M. Vaughan

Language: English

Topic: Electron and X-Ray Spectroscopy Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2161845585

FWCI: 2.704

Cites: 7

Cited by: 506

Related to: 10