Work

Sophisticated masks

Year: 1991

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.29747

Authors: Roger Fabian W. Pease, Gerry Owen, Raymond Browning, Robert L. Hsieh, Julienne Y. Lee, Nadim I. Maluf, C. Neil Berglund

Institutions: Stanford University, Hewlett-Packard (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4235804058

FWCI:

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