Work

Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

Year: 2022

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2022.154657

Authors: Jayant K. Lodha, Ivan Pollentier, Thierry Conard, Remi Vallat, Stefan De Gendt, Silvia Armini

Institutions: IMEC, KU Leuven

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4293879836

FWCI: 0.953

Cites: 60

Cited by: 16

Related to: 10