Work

Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer

Year: 2009

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2009.11.018

Authors: T. El Asri, M. Raissi, S. Vizzini, A. El Maachi, E.L. Ameziane, F. Arnaud d’Avitaya, J.-L. Lazzari, C. Coudreau, H. Oughaddou, B. Aufray, A. Kaddouri

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1989509244

FWCI: 1.297

Cites: 16

Cited by: 15

Related to: 10