In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry
Year: 2024
Type: article
DOI: 10.1116/6.0003830
Authors: Yousra Traouli, Ufuk Kilic, Sema G. Kilic, Matthew Hilfiker, Daniel Schmidt, Stefan Schoeche, Eva Schubert, Mathias Schubert
Language: English
Topic: ZnO doping and properties
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: The influence of doping and annealing onto the lattice dynamics, band structure and free charge carrier properties in monoclinic gallium aluminum oxide semiconductor alloys, G2971774010, G441682718, Semiconductor-based Terahertz Traveling Wave Amplifiers for Monolithic Integration, G585296059, NSF-DFG: Advances in Ion-Surface Interaction-Driven Manufacturing of One-Dimensional Metal Oxide Heterostructures, RII Track-1: Emergent Quantum Materials and Technologies (EQUATE)
OpenAlex ID: W4402313566
