Work

Understanding surface morphology evolution in magnetron sputtered AlN templates: mitigating tensile stress and enhancing crystal quality

Year: 2025

Type: article

Abstract: The surface morphology evolution mechanism depending on the thickness of sputtered AlN films is revealed, and smooth high-quality AlN films are successfully fabricated.

Source: CrystEngComm

DOI: 10.1039/d5ce00027k

Authors: Li Jiang, Jianwei Ben, Ke Jiang, Shanli Zhang, Tong Wu, Zikai Nie, Entao Zhang, Shunpeng Lu, Xiaojuan Sun, Dabing Li

Institutions: University of Science and Technology of China, Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Dalian University of Technology, University of Chinese Academy of Sciences

Language: English

Topic: GaN-based semiconductor devices and materials

Subfield: Condensed Matter Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: hybrid

Funders: Natural Science Foundation of Jilin Province, National Natural Science Foundation of China, Youth Innovation Promotion Association of the Chinese Academy of Sciences, National Key Research and Development Program of China

Awards: G2176408726, G2291484333, G3307160319, G3890929174, G4046130396, G5063899986, G7297603460, G8987720749

OpenAlex ID: W4409278913

FWCI: 0.623

Cites: 37

Cited by: 2

Related to: 10