Work

Influence of etching profile on pattern collapse in complementary metal oxide semiconductor image sensor pixel with deep trench isolation

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004309

Authors: Clément Sart, Jérôme Dubois, Emilie Prevost, Philippe Garnier, Benjamin Vianne, Frédéric Giovannoni, Caroline Bringolf-Penner, Sébastien Gallois-Garreignot

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409293309

FWCI: 0.462

Cites: 19

Cited by: 2

Related to: 10