Physics-based AI models for optimization of a multistep, multistate RF pulsed contact hole etch process
Year: 2025
Type: conference-abstract
DOI: 10.1117/12.3049202
Authors: Bruce Edelman, Jaekwang Song, Yang Ban, Dohaing Lee, Stephen M. Sirard, Meghali C. Chopra, Keun Hee Bai
Institution: Samsung Electronics (South Korea)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655755