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Al-Doped HZO: A BEoL compatible Ferroelectric Material for Automotive-Grade Memory

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Year: 2025
Type: conference-paper
Source: IEEE International Memory Workshop (IMW)
DOI: 10.1109/imw61990.2025.11026934
Authors: David Lehninger, Ayse Sünbül, Hannes Mähne, Thomas Kämpfe, Alison Viegas, Justine Barbot, Kerstin Bernert, Steffen Thiem, Konrad Seidel, Maximilian Lederer
Institutions: Fraunhofer Institute for Photonic Microsystems, Center Nanoelectronic Technologies, X-Fab (Germany)
Language: English

Topic: Ferroelectric and Negative Capacitance Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W4411233435
FWCI: 7.075
Cites: 16
Cited by: 3
Related to: 10
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