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Enhanced Ferroelectricity in $\text{Hf}_{0.5} \text{Zr}_{0.5} \mathrm{O}_{2}$ Thin Films by NLA at Intermediate Laser Energy Density

Year: 2025

Type: conference-paper

Source: International Conference on IC Design and Technology

DOI: 10.1109/icicdt65192.2025.11078051

Authors: David Lehninger, Tianren Zhang, Peter Reinig, Justine Barbot, Mathieu Opprecht, Sébastien Kerdiles, Laurent Grenouillet, Konrad Seidel, Maximilian Lederer

Institutions: Fraunhofer Institute for Photonic Microsystems, Center Nanoelectronic Technologies, X-Fab (Germany), Commissariat à l'Énergie Atomique et aux Énergies Alternatives, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413067414

FWCI:

Cites: 13

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Related to: 10