Work

Improving Atomic Layer Deposition Process of Silicon Oxide (SiO2)

Year: 2025

Type: conference-paper

Source: International Spring Seminar on Electronics Technology

DOI: 10.1109/isse65583.2025.11120989

Authors: Long Lei, Pauline Dill, Erik Schumann

Institution: Fraunhofer Institute for Photonic Microsystems

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4413319611

FWCI: 2.358

Cites: 8

Cited by: 1

Related to: 10