Author

S. Rader

Observed name: Scott Rader

OpenAlex ID: A5004530778

Topography Reduction During Barrier CMP Improved Due to Tantalum Oxidation

2002 · Paul Lefevre, Katsuyoshi Ina, et al. · MRS Proceedings · 1

Analytical and functional characterization of recycled fumed silica slurries in ILD CMP

2003 · Patrick Levy, S. Rader, et al.

Comparison of copper disc and copper wafer polishing processes in terms of their kinetic, tribological and thermal characteristics

2003 · Z. Li, Ara Philipossian, et al.

Works count: 3

Citation count: 1

H-index: 1

I10-index: