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Linda K. Sundberg

Observed names: L. K. Sundberg, L. Sundberg, L.K. Sundberg, Linda Sundberg
Institution: IBM (United States)
OpenAlex ID: A5005218219
Versatile synthesis of nanometer sized hollow silica spheresElectronic supplementary information (ESI) available: experimental; IR and XPS; AFM, SEM and TEM images. See http://www.rsc.org/suppdata/cc/b2/b212811j/
2003 · Jeroen J. L. M. Cornelissen, Eric. F. Connor, et al. · Chemical Communications · 63
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Templating of Silsesquioxane Cross‐Linking Using Unimolecular Self‐Organizing Polymers
2003 · Eric F. Connor, Linda K. Sundberg, et al. · Angewandte Chemie International Edition · 46
Liquid immersion lithography: evaluation of resist issues
2004 · William Hinsberg, Gregory M. Wallraff, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 38
A Fundamental Study on Dissolution Behavior of High-Resolution Molecular Glass Photoresists
2008 · Anuja De Silva, Linda K. Sundberg, et al. · Chemistry of Materials · 29
Formulation Graphs for Mapping Structure-Composition of Battery Electrolytes to Device Performance
2023 · Vidushi Sharma, Maxwell Giammona, et al. · Journal of Chemical Information and Modeling · 26
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Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
2006 · Vivek M. Prabhu, Sharadha Sambasivan, et al. · Applied Surface Science · 20
Sub-50nm half-pitch imaging with a low activation energy chemically amplified photoresist
2004 · G. M. Wallraff, D. R. Medeiros, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 19
Templating of Silsesquioxane Cross‐Linking Using Unimolecular Self‐Organizing Polymers
2003 · Eric F. Connor, Linda K. Sundberg, et al. · Angewandte Chemie · 19
Fluoro-alcohol materials with tailored interfacial properties for immersion lithography
2007 · Daniel P. Sanders, Linda K. Sundberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Design of Protective Topcoats for Immersion Lithography
2005 · Robert D. Allen, Phillip J. Brock, et al. · Journal of Photopolymer Science and Technology · 18
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Chemical foundation model-guided design of high ionic conductivity electrolyte formulations
2025 · Murtaza Zohair, Vidushi Sharma, et al. · npj Computational Materials · 13
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Templating Organosilicate Vitrification Using Unimolecular Self‐Organizing Polymers Prepared from Tandem Ring Opening and Atom Transfer Radical Polymerizations
2004 · T. Magbitang, V.Y. Lee, et al. · Macromolecular Symposia · 13
Positive Resists Based on Non-polymeric Macromolecules
2005 · Ratnam Sooriyakumaran, Truong Hoa, et al. · Journal of Photopolymer Science and Technology · 12
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Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography
2006 · A. D. Allen, G. Breyta, et al. · Journal of Photopolymer Science and Technology · 11
193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers
2005 · Pushkara R. Varanasi, Ranee W. Kwong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)
2005 · Ratnam Sooriyakumaran, Hoa Truong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Oxygen Assisted Lithium‐Iodine Batteries: Towards Practical Iodine Cathodes and Viable Lithium Metal Protection Strategies
2023 · Maxwell J. Giammona, Jangwoo Kim, et al. · Advanced Materials Interfaces · 9
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Integration of polymer self-assembly for lithographic application
2008 · Joy Y. Cheng, Daniel P. Sanders, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Self-segregating materials for immersion lithography
2008 · Daniel P. Sanders, Linda K. Sundberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
The effect of photoresist/topcoat properties on defect formation in immersion lithography
2006 · G. M. Wallraff, C. E. Larson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Evaluation of functional properties of imaging materials for water immersion lithography
2005 · William D. Hinsberg, J. A. Hoffnagle, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Fluoroalcohol-Methacrylate Resists for 193nm Lithography
2005 · P. R. Varanasi, R. W. Kwong, et al. · Journal of Photopolymer Science and Technology · 6
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Nanoporous, Low-Dielectric Constant Organosilicate Materials Derived from Inorganic Polymer Blends
2004 · R. D. Miller, W. Volksen, et al. · ACS symposium series · 6
A method to characterize pattern density effects: chemical flare and develop loading
2010 · Linda K. Sundberg, Gregory M. Wallraff, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Studies of acid diffusion in low Ea chemically amplified photoresists
2005 · G. M. Wallraff, D. R. Medeiros, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Works count: 50
Citation count: 476
H-index: 12
I10-index: 16
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