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Taejun You

Observed names: Tae Jun You, Tae-Jun You, Tae-jun You
OpenAlex ID: A5017698337
Simple method for decreasing wafer topography effect for implant mask
2016 · Taejun You, Taehyeong Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Full-chip model-based OPC verification by using rigorous resist 3D model
2014 · Dongho Kong, Taejun You, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Resolution enhancement techniques for contact hole printing of sub-50nm memory device
2008 · Hye-Jin Shin, Tae-jun You, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Study of OPC accuracy by illumination source types
2009 · Kiho Yang, Daejin Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
The analysis of polarization characteristics on 40nm memory devices
2009 · Minae Yoo, Chanha Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
The study of contact hole for 65nm node with KrF
2006 · Tae-Jun You, Sung-Woo Ko, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
2003 · Tae-Jun You, Hyeong-Soo Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography
2003 · Young-Sik Kim, Tae Jun You, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
CD metrology for avoiding shrinkage of ArF resist patterns in 100 nm ArF lithography
2002 · Tae-Jun You, Cheol-Kyu Bok, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 9
Citation count: 9
H-index: 3
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