Work

The study of contact hole for 65nm node with KrF

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.681825

Authors: Tae-Jun You, Sung-Woo Ko, James Moon, Yeong-Bae Ahn, Byung-Ho Nam, Dong-Gyu Yim

Institution: SK Hynix (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1981304472

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