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Byung-Ho Nam
Observed names:
Byung H. Nam,
Byungho Nam
Institution:
SK Hynix (South Korea)
Observed institutions:
SK Group (United States),
LG (South Korea),
SK Hynix (South Korea)
OpenAlex ID:
A5042867486
Comparative study of DRAM cell patterning between ArF immersion and EUV lithography
2009
·
Tae-Seung Eom
, Sarohan Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Self-assembled dummy patterns for lithography process margin enhancement
2007
·
James Moon
, Byoung-Sub Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
EUV-patterning characterization using a 3D mask simulation and field EUV scanner
2009
·
Jun-Taek Park
, Yoon-Suk Hyun
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
A method of utilizing AIMS to quantify lithographic performance of high transmittance mask
2014
·
Chun Seon Choi
, Dong Sik Jang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
A Technique for the Non-Destructive EUV Mask Sidewall Angle Measurement Using Scanning Electron Microscope
2013
·
Sangheon Lee
, Junhwan Lee
, et al.
·
Journal of Nanoscience and Nanotechnology
·
2
Probe-beam scan-type autofocus system using position-sensing detector for sub-half-micron lithography tools
1996
·
Dohoon Kim
, Byung-Ho Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Binary and attenuated PSM mask evaluation for sub 50nm device development perspective
2008
·
James Moon
, Byoung-Sub Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Highly accurate modeling by using 2-dimensional calibration data set for model-based OPC verification
2006
·
Cheol-kyun Kim
, Jae-Seung Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Considerations of model-based OPC verification for sub-70nm memory device
2006
·
Cheol-Kyun Kim
, Jae-Seung Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Highly accurate hybrid-OPC method for sub-60nm memory device
2006
·
Hyoung-Soon Yune
, Cheol-Kyun Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
PDF
Double exposure to reduce overall line-width variation of 80-nm DRAM gate
2004
·
Won K. Ma
, Chang-Moon Lim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Gate CD Control for memory Chip using Total Process Proximity Based Correction Method
2002
·
Byung-Ho Nam
, Hyung-J. Lee
·
Journal of the Optical Society of Korea
·
1
PDF
Wafer scale error induced by bottom antireflective coating
2001
·
Dong-Seok Kim
, JongHo Jeong
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Optimal design of antireflective layer for DUV lithography and experimental results
1997
·
Seung-Gol Lee
, Kyung-Il Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
DFM application on dual tone sub 50nm device
2008
·
Byoung-Sub Nam
, James Moon
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Automatic residue removal for high-NA extreme illumination
2007
·
James Moon
, Byong-Sub Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Application of full-chip optical proximity correction for sub-60-nm memory device in polarized illumination
2007
·
Hyoung-Soon Yune
, Yeong-Bae Ahn
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
The study of contact hole for 65nm node with KrF
2006
·
Tae-Jun You
, Sung-Woo Ko
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Lithography process margin enhancement using illumination based assist pattern
2006
·
James Moon
, Dong-Jin Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Simple method to verify OPC data based on exposure condition
2006
·
James Moon
, Young-Bae Ahn
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Hybrid ORC method for Low K1 process
2005
·
Byungho Nam
, Jaeseung Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Effect of delay time on the performance of DUV resist for various pattern size and shape
2002
·
Dong-Seok Kim
, Jong O Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Lens aberration measurement and analysis using a novel pattern
2001
·
Byung-Ho Nam
, Byeong-Ho Cho
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction
2001
·
Byung-Ho Nam
, Dong-Seok Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Gate CD control for full chip using total-process-proximity-based correction method
2000
·
Byung-Ho Nam
, Jong O Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
25
Citation count:
30
H-index:
3
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