Work

Gate CD control for full chip using total-process-proximity-based correction method

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.392101

Authors: Byung-Ho Nam, Jong O Park, Dai Jong Lee, Jong Ho Cheong, Young J. Hwang, Young Jin Song

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2019720116

FWCI:

Cites:

Cited by:

Related to: 10