Author

Mathias Tomandl

Observed names: M. Tomandl, Tomandl, Mathias
OpenAlex ID: A5018700533
2011 · Stefan Gerlich, Sandra Eibenberger, et al. · Nature Communications · 396
2009 · William B. Case, Mathias Tomandl, et al. · Optics Express · 143
2015 · Mathias Tomandl, Thomas Mieling, et al. · Scientific Reports · 14
2024 · Mathias Tomandl, Christoph Spengler, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 13
2023 · Mathias Tomandl, Christoph Spengler, et al. · European Mask and Lithography Conference (EMLC) · 7
2024 · Hyoyeon Kim, Hyungrae Noh, et al. · Photomask and next-generation lithography mask technology. Conference · 3
2010 · Tomandl, Mathias · University of Vienna · 2
2023 · Mathias Tomandl, Christof Klein, et al. · SPIE Photomask Technology Conference · 1
2023 · Kyungsup Shin, Sunyoung Kim, et al. · Photomask and next-generation lithography mask technology. Conference · 1
2023 · Bassam Shamoun, Zachary Alberti, et al. · SPIE Novel Patterning Technologies · 1
2011 · Sandra Eibenberger, Stefan Gerlich, et al. · Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)
2011 · Stefan Gerlich, Sandra Eibenberger, et al. · Bulletin of the American Physical Society
Works count: 12
Citation count: 581
H-index: 5
I10-index: 4
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