Work

Improvement of mask pattern placement error using novel resist charging control methodology in multi-beam mask writer

Year: 2024

Type: conference-paper

Source: Photomask and next-generation lithography mask technology. Conference

DOI: 10.1117/12.3032199

Authors: Hyoyeon Kim, Hyungrae Noh, Wonsik Shin, Kangho Park, Youngjae Lee, Sangho Jo, Youngsu Sung, Hojune Lee, Heebom Kim, Jin Choi, Sanghee Lee, Alexander Egl, Gottfried Hochleitner, Matthias Kühmayer, Matthias Liertzer, Francesco Massa, Mathias Tomandl

Institutions: Samsung Electronics (South Korea), IMS Nanofabrication (Austria)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401877488

FWCI: 2.005

Cites: 9

Cited by: 3

Related to: 10