Author

Frank. C.C. Wang

Institutions: United Microelectronics (Taiwan), United Microelectronics (United States)

Observed institutions: United Microelectronics (Taiwan), United Microelectronics (United States)

OpenAlex ID: A5022067072

Novel chlorine-enriched SiO2/Si3N4 bilayers to downscale gate dielectrics toward sub-45nm and beyond

2010 · Frank. C.C. Wang, Charles CL Lin, et al. · International Conference on Advanced Thermal Processing of Semiconductors

Works count: 1

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