Work

Novel chlorine-enriched SiO2/Si3N4 bilayers to downscale gate dielectrics toward sub-45nm and beyond

Year: 2010

Type: conference-paper

Source: International Conference on Advanced Thermal Processing of Semiconductors

DOI: 10.1109/rtp.2010.5623791

Authors: Frank. C.C. Wang, Charles CL Lin, Y.R. Wang, Shao Wei Wang, Tsuo Wen Lu, Michael Chan, Chan Lon Yang, J Y Wu

Institutions: United Microelectronics (Taiwan), United Microelectronics (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005381455

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