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M.F. Li
Institution:
National University of Singapore
Observed institution:
National University of Singapore
OpenAlex ID:
A5032239463
A high performance MIM capacitor using HfO2 dielectrics
2002
·
Hang Hu
, Chunxiang Zhu
, et al.
·
IEEE Electron Device Letters
·
136
Laminated metal gate electrode with tunable work function for advanced CMOS
2004
·
S.H. Bae
, W.P. Bai
, et al.
·
Symposium on VLSI Technology
·
19
Investigation of PVD HfO/sub 2/MIM capacitors for SiRf and mixed signal ICs application
2004
·
Hang Hu
, Shi-Jin Ding
, et al.
·
International Semiconductor Device Research Symposium
·
1
Improved crystallization temperature and interfacial properties of HfO/sub 2/ gate dielectrics by adding Ta/sub 2/O/sub 5/ with TaN metal gate
2004
·
Xiongfei Yu
, Chunxiang Zhu
, et al.
·
International Semiconductor Device Research Symposium
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Works count:
4
Citation count:
156
H-index:
2
I10-index:
2
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