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Megumi Jyousaka

Observed names: Jyousaka Megumi, M. Jyousaka
Observed institution: Tokyo Electron Kyushu Ltd (Japan)
OpenAlex ID: A5035450768
Improvement of gate CD uniformity for 55 nm node logic devices
2008 · Takashi Murakami, Taisaku Nakata, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Process manufacturability evaluation for next generation immersion technology node
2008 · M. Enomoto, T. Shimoaoki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
CDU improvement technology of etching pattern using photo lithography
2008 · Masahide Tadokoro, Shinichi Shinozuka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
フォトリソグラフィーを用いたエッチングパターンのクリティカルディメンジョン均一性(cdu)改善技術
2008 · Tadokoro Masahide, Shinozuka Shinichi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 4
Citation count: 3
H-index: 1
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