Work

Improvement of gate CD uniformity for 55 nm node logic devices

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.771548

Authors: Takashi Murakami, Taisaku Nakata, Kensuke Taniguchi, Takayuki Uchiyama, Megumi Jyousaka, Masahide Tadokoro, Yoshitaka Konishi

Institutions: NEC (Japan), Tokyo Electron Kyushu Ltd (Japan), Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bhabha Atomic Research Centre

OpenAlex ID: W1998394773

FWCI: 0.946

Cites: 2

Cited by: 2

Related to: 10