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Marco Haverlag

Observed names: Haverlag, M Marco, Haverlag, M., Haverlag, Marco, M Haverlag, M. A. Haverlag, M. Haverlag
OpenAlex ID: A5041601965
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
1994 · G. S. Oehrlein, Y. Zhang, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 198
Measurements of negative ion densities in 13.56-MHz rf plasmas of CF4, C2F6, CHF3, and C3F8 using microwave resonance and the photodetachment effect
1991 · M. Haverlag, A. Kono, et al. · Journal of Applied Physics · 102
Production and destruction of CFx radicals in radio-frequency fluorocarbon plasmas
1996 · M. Haverlag, W. W. Stoffels, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 84
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Temporal behavior of the electron and negative ion densities in a pulsed radio-frequency CF4 plasma
1991 · A. Kono, M. Haverlag, et al. · Journal of Applied Physics · 83
Speed of streamers in argon over a flat surface of a dielectric
2008 · A Sobota, A Lebouvier, et al. · Journal of Physics D Applied Physics · 71
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Measurements of radical densities in radio-frequency fluorocarbon plasmas using infrared absorption spectroscopy
1994 · M. Haverlag, E. Stoffels, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 71
Measurement of the gas temperature in fluorocarbon radio frequency discharges using infrared absorption spectroscopy
1996 · M. Haverlag, E. Stoffels, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 47
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Negative Ions in Low Pressure Discharges
1995 · E. Stoffels, W. W. Stoffels, et al. · Contributions to Plasma Physics · 43
Sidewall passivation during the etching of poly-Si in an electron cyclotron resonance plasma of HBr
1994 · M. Haverlag, G. S. Oehrlein, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 43
Negative ions in a radio-frequency plasma in CF 4
1991 · J L Jauberteau, G J Meeusen, et al. · Journal of Physics D Applied Physics · 38
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Measurement of electron densities by a microwave cavity method in 13.56-MHz RF plasmas of Ar, CF4, C2F6, and CHF3
1991 · M. Haverlag, G. M. W. Kroesen, et al. · Plasma Chemistry and Plasma Processing · 33
Optical and electrostatic potential investigations of electrical breakdown phenomena in a low-pressure gas discharge lamp
2010 · M F Gendre, M Haverlag, et al. · Journal of Physics D Applied Physics · 32
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High-K(‘propeller’) states in the infrared spectrum of the Ar-CO complex
1996 · Yunjie Xu, S. Civiš, et al. · Molecular Physics · 31
Photodetachment effect in a radio frequency plasma in CF4
1989 · J. L. Jauberteau, G. J. Meeusen, et al. · Applied Physics Letters · 29
Amorphous hydrogenated silicon films produced by an expanding argon-silane plasma investigated with spectroscopic IR ellipsometry
1991 · A.T.M. Wilbers, G.J. Meeusen, et al. · Thin Solid Films · 28
Ellipsometric study of silicon surface damage in electron cyclotron resonance plasma etching using CF4 and SF6
1992 · M. Haverlag, D. Vender, et al. · Applied Physics Letters · 26
Pulse, dc and ac breakdown in high pressure gas discharge lamps
2008 · J Beckers, F Manders, et al. · Journal of Physics D Applied Physics · 25
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Definition of a high intensity metal halide discharge reference lamp
2006 · W W Stoffels, A H F M Baede, et al. · Measurement Science and Technology · 25
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IR absorption spectroscopy
1991 · Gmw Gerrit Kroesen, M. Haverlag · TU/e Research Portal · 25
Axial segregation in metal–halide lamps under varying gravity conditions during parabolic flights
2006 · A J Flikweert, M van Kemenade, et al. · Journal of Physics D Applied Physics · 23
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The chemistry of a CCl2F2 radio frequency discharge
1995 · W. W. Stoffels, E. Stoffels, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 23
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The Role of Metastables in the Formation of an Argon Discharge in a Two-Pin Geometry
2010 · Ana Sobota, Freddy Manders, et al. · IEEE Transactions on Plasma Science · 22
Numerical description of high frequency ignition of fluorescent tubes
2007 · W J M Brok, M F Gendre, et al. · Journal of Physics D Applied Physics · 22
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Fast silicon etching using an expanding cascade arc plasma in a SF6/argon mixture
1992 · J. J. Beulens, A. T. M. Wilbers, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 22
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High-frequency cold ignition of fluorescent lamps
2002 · M Haverlag, A Kraus, et al. · Journal of Physics D Applied Physics · 21
Works count: 125
Citation count: 1,607
H-index: 22
I10-index: 47
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